earthgod2504
Junior Member level 2
I have a question relating to fab process of semiconductor using lithographic process.
In this process, we need a lighting source (UV) to pass though a mask and project on the photo-resist.
So my question is for a particular IC, fab needs to have specific masks for that IC, is it right?
And, how do we have that mask or how it is produced?
Thanks,
In this process, we need a lighting source (UV) to pass though a mask and project on the photo-resist.
So my question is for a particular IC, fab needs to have specific masks for that IC, is it right?
And, how do we have that mask or how it is produced?
Thanks,