vlsi_design2
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Hi,
1) I checked the metal stack of a few commercial CMOS node. The loss tangent of the dielectric is not defined. Is it because the dielectric losses are minimal compared to substrate and conductor losses in typical CMOS process?
2) Further, if the node provides an option of high res substrate layer below inductors, how do I include its effect in EM sim? Do I need to update the resistivity of substrate in the metal stack file?
Thanks!!
1) I checked the metal stack of a few commercial CMOS node. The loss tangent of the dielectric is not defined. Is it because the dielectric losses are minimal compared to substrate and conductor losses in typical CMOS process?
2) Further, if the node provides an option of high res substrate layer below inductors, how do I include its effect in EM sim? Do I need to update the resistivity of substrate in the metal stack file?
Thanks!!