cmos fabrication technologies

Status
Not open for further replies.

raghunaandan

Newbie level 3
Joined
Dec 15, 2014
Messages
3
Helped
0
Reputation
0
Reaction score
0
Trophy points
1
Location
bangalore
Visit site
Activity points
17
what is the difference b/w silicide and salicide techniques of mos fabrication ? explain in breif ? :thinker::thinker:
 

Salicide is self-aligned silicide, and hits the gate and S/D
regions. You get lower gate resistance and lose some
issues with LDD vs silicided S/D region control because
the spacer/gate hard mask keeps the silicide where it
belongs.

Silicide to me means it's shot at the S/D through a mask
of its own, or only in the contacts (silicide by subsequent
sinter).

But you can't assume it's not a matter of careless expression
either, not everybody cares about every detail and strictly
speaking, both styles are silicide.
 
Status
Not open for further replies.
Cookies are required to use this site. You must accept them to continue using the site. Learn more…