ShiningYoung
Newbie
I read the paper 'Conductor Loss of Capacitively Loaded Slow Wave Electrodes for High-Speed Photonic Devices' and 'Microwave index engineering for slow-wave coplanar waveguides'.
The authors utilize T-shaped electrodes to increase the effective index.
However, I get a much lower results from HFSS simulation. From the simulation, I obtained an effective index only 2.5-2.6, which is almost the same as results without T-shaped electrodes.
While in the paper with the same structure they obtained an effective index much above 3.0.
Where is problem with my simulation setup? I use a Silicon substrate of which thickness is 500um, electrode thickness is 0.3um, and wave port size is 300um x 300um. The field excited by port converges well.
The authors utilize T-shaped electrodes to increase the effective index.
However, I get a much lower results from HFSS simulation. From the simulation, I obtained an effective index only 2.5-2.6, which is almost the same as results without T-shaped electrodes.
While in the paper with the same structure they obtained an effective index much above 3.0.
Where is problem with my simulation setup? I use a Silicon substrate of which thickness is 500um, electrode thickness is 0.3um, and wave port size is 300um x 300um. The field excited by port converges well.
