which fabrication technology of vlsi gives higher capacitance

Status
Not open for further replies.

maheshkumar.g

Member level 1
Joined
Oct 7, 2012
Messages
35
Helped
0
Reputation
0
Reaction score
0
Trophy points
1,286
Visit site
Activity points
1,515
hi all,
i want to know which fabrication technology 90 nm & 28 nm will result in higher capacitance and why
thank you
 

Well capacitance is directly proportion to oxide thickness of MOS and cap between the metal layers. it is simple answer it is 90nm will offer you more cap. On the other hand cap is not the most important criterion, it is the speed of the device which is dependent on voltage, size of the routes etc. As you see the speeds have been increasing so less cap to charge and discharge.
 


The capacitance is actually inversely proportional to the oxide thickness. C= ξA/d where d= distance between the plates. So, as the thickness of oxide goes on decreasing, the distance between the gate and substrate reduces and cap goes up.
 

Status
Not open for further replies.
Cookies are required to use this site. You must accept them to continue using the site. Learn more…