Sambhav_1
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Hi,
I am comparing the two technology nodes,the new one is the fast devices version, and the devices in the new node are faster,i.e Id has increased and vt has reduced.but when i am comparing the simulation results(Mixed signal circuit, only inverters and level shifter are there), then current from VDD has been reduced significantly,however acc. to me it should have increased. I want to know what i might be missing or where i am getting wrong.
these are the variation in new models as compared to previous based on simulating it at trip point.
Pmos--> current has been increased by 20%,vt reduced by 11% and gate cap is reduced by 2% (approx numbers)
NMOS -->almost same
Regards
I am comparing the two technology nodes,the new one is the fast devices version, and the devices in the new node are faster,i.e Id has increased and vt has reduced.but when i am comparing the simulation results(Mixed signal circuit, only inverters and level shifter are there), then current from VDD has been reduced significantly,however acc. to me it should have increased. I want to know what i might be missing or where i am getting wrong.
these are the variation in new models as compared to previous based on simulating it at trip point.
Pmos--> current has been increased by 20%,vt reduced by 11% and gate cap is reduced by 2% (approx numbers)
NMOS -->almost same
Regards