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Using the HRIS (High Resistance Poly Silicon)

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Junus2012

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Hello,

I have the HRIS in my used technology, the resistor is incredibly high. However, when I study the analog cells provided by the foundry I see that they still use the normal poly2 resistor which consumes a lot of area, what is the reason?

the second question, if the HRIS is a given option, why one should think of using MOS resistor which is not good linear?

Than you in advance
 

I have the HRIS in my used technology, the resistor is incredibly high.
What does it mean?

However, when I study the analog cells provided by the foundry I see that they still use the normal poly2 resistor which consumes a lot of area, what is the reason?
Mentioned HRIS (would be nice to know what Is stands for) might be special device, which requires additional mask, has large process variation or other drawbacks. DRM should dispel your doubts.
the second question, if the HRIS is a given option, why one should think of using MOS resistor which is not good linear?
Ibidem
 

High resistivity poly will have higher tempco and
larger varability of tempco & sheet resistance,
being more determined by grain boundary
attributes (which are neither monitored or
controlled particularly) than by a controlled
implant dose.

MOS resistors are probably even worse. If you
need consistency you'd use a device that is
a WAT control-point, or at least has such a
credible proxy.
 

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