Interesting...,it seems my version may have this after all. You have taugfht me something I did not know...
Now remember that Silvaco is modelling the effect of depassivation at a rate you determine - so it is not simulating actual loss of hydrongen to give dangling bonds but is empirically modelling what would happen if de-passivation occurs under the rate you give it.
In a real situation, the number of passivated dangling bonds cannot be known as it is process dependent. Nor can the rate of depassivation under stress nor the re-passivation under recovery. So in real life, if you change the gate oxide pre-clean and gate oxidation process, you may change the performance to NBTI stress. If you did the same in you simulation of the gate oxide process nothing would change in the simulation.
However, you could use Silvaco as a means top back track from a known NBTI effect to guess what the actual rates and density of traps was.
So the best thing to do is just try it out. Start with DC and stress your pmos with a gate voltage of -Vdd or more at 100C for X hours after entering the same parameters given in the webpage you mentioned. If this shows a voltage threshold change then you can proceed from there. I do not have access to this version of Silvaco but there model is quite straight forward. I will try do something here.
Since the variation in Vt with NBTI stress in in the order or 10 - 100's of mV, then it is better to use log scale when showing differences.