andy_z
Newbie level 3
bond pad design rule
We use TSMC 0.18micron 6 Metal 1 Poly (1.8V/3.3V) technology.We currently use bond pads with a metal pads defined on all 6 metal layers under the passivation bond pad opening. These is a number of vias linking these metal pads together.
The idea is to remove the metal pads from layers 1,2,3 or even from layers 1-5,i.e. to leave the top metal pads only.
We need it to reduce bond pad capacitance.
Can somebody advise on feasibility of this approach from die manufacturing and flip chip assembly point of view?
We use TSMC 0.18micron 6 Metal 1 Poly (1.8V/3.3V) technology.We currently use bond pads with a metal pads defined on all 6 metal layers under the passivation bond pad opening. These is a number of vias linking these metal pads together.
The idea is to remove the metal pads from layers 1,2,3 or even from layers 1-5,i.e. to leave the top metal pads only.
We need it to reduce bond pad capacitance.
Can somebody advise on feasibility of this approach from die manufacturing and flip chip assembly point of view?