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resist response to light

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shady_abdelwahed

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Hi every body,

Does any one know a resource about the response of photoresists -in the semiconductor industry- to light?

Best Regards,
Shady
 

Hi,
Please clarify, do you mean application of photoresist in semiconductor industry?

Regards,
Laktronics
 

No, I mean how does resist materials respond to light. is the formation of the latent image in the resist dependent on the light slope, for example? or, is it just a constant value of the light intensity?

I need to know how is the image formed in the resist material when exposed to light.
 

Not only the intensity and time, but also on wavelength of the light.
 

i normaly using dry film photoresist for pcb and for about 1 min to 3 min depending the track width and spacing
 

Modern photorestists are made of a novolac resin with a photo active compound. The photo active compount when exposed to UV light forms an organic acid which is soluble is a weak alkali developer (usually tri-methyle ammonium hydroxide). The thickness of resist is spun in at between 0.6 and 1.2um for the high resolution layers and 1.2-2.2um for layers that block implants.
The resolution of the developed image depends on the resist thickness, the focus of the camera, the partial coherence of the UV light, the modulation transfer function of the image (slope of light from dark to clear) and a similar chemical MTF for the develop process.
 

photorestists are made of a resin with a photo active compound.
The photo active compound when exposed to UV or any other photons the cross linked chemical bonds will activated, depending upon the photo resist type it will dissolve the exposed part or unexposed part to developer. then remaining is exposed or unexposed (Positive or Negative Photo resist).
The photo resist is specific to spectral line, the dose depends upon the thickness of the photo resist, thickness is depends upon the spinning speed.

this all information available with supplier data sheet
 

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