Hi,
How do we compare electromigration in submicron trechnology and deep submicron technology.
1. EM aoocurs both in Submicron as well as Deep Submicron , but the effects are adverse in DSM, How can we justify it.
eg : For Submicron Process I have a current of say 5milliamps to pass , i can use a 5um thick metal line,it can be done in the same way in the DSM also, but how do we justify that EM is more in DSM than Submicron process.
I would be great if some one explains this in ( detail please )
Thanks in advance.