Electromigration lifetime is inverse to current density
and current density, inverse to width.
You will encounter limits on conductor width in any
modern fab, and will have to slot or space to meet
them.
Wider metal is more area-efficient than multiple
narrower stripes of equal total width.
The spacing of metal to "wide metal" is often larger
than basic spacing rules. This can impact layout to
some small extent. I tend to lay out lines at the
"wide metal" threshold minus 0.1 - 1um in low level
bussing. There will be some cases where two not-
wide lines will carry more current in the same area
(net width inclusing spacings) than one "wide" one
of equal conductor cross-section. Not too many,
but some (right about, and up to 2X the "wide"
threshold).
Supposedly if your metal line becomes narrower than
metal grain size, electromigration improves markedly.
But you will not know this grain size, and the foundry's
control of it, in all likelihood.