device ft fmax
A useful equation which relates ft to fmax (bipolar technology) is:
Fmax = (Ft/(8*pi*rbb*Cbc))^0.5 [1]
Fmax is much more useful than Ft in a high-speed large-signal application. If the technologist optimized rbb & Cbc with Ft, then typically Fmax > Ft. In another words, if Foundry A Ft = Foundry B Ft, but Foundry A Fmax > Foundry B Fmax => Foundry A circuit will be faster than Foundry B.
Using equation [1] as a guideline, these are some conditions that would lead to degradation of Fmax with respect to Ft (Fmax < Ft):
1) Ft is high, rbb is high: Peak base concentration is not high enough, therefore increasing base resistance. The increase in base resistance degrades Fmax. Other symptoms would include low Early voltage, low BVceo and high Beta.
2) Ft is high, rbb is high, Cbc is high => Fmax is degraded. An unoptimized selective implanted collector (SIC) implant, which is used to suppress Kirk effect, is positioned to close to the bottom of the base profile. This causes to effective base width to decrease which increases base resistance. In addition, since the SIC implant is ~1e17/cm3 vs. ~2e16/cm3 concentration for n-epi/nwell, your collector-base capacitance will increase.
From a circuit designer's perspective, Cbe ~ gm/(2*pi*Ft). Therefore, your diffusion capacitance is dominated by the Ft of your transistor. On the other hand, a high Cbc and rbb will limit the bandwidth of your circuit. In addition, a high rbb will increase your input noise thus degrading your circuit's input sensitivity.