leohart
Full Member level 4
what is the mechnism behind using heavy surface p+
implant to reduces the collection of dark current(just normal electron/holes) generated at si-sio2 surface?
Seems this is relating to fermi level adjusting so the gene/recomb centers is
filled/depeleted(a techinque used at location you dont want many gene/recomb to
happen)...but I'm not so sure,no semicon physics textbook talks about this in
detail...Can you exlain me or recommand some references?
implant to reduces the collection of dark current(just normal electron/holes) generated at si-sio2 surface?
Seems this is relating to fermi level adjusting so the gene/recomb centers is
filled/depeleted(a techinque used at location you dont want many gene/recomb to
happen)...but I'm not so sure,no semicon physics textbook talks about this in
detail...Can you exlain me or recommand some references?