020170
Full Member level 4
following picture shows lateral BJT under CMOS process.
In P-substrate CMOS process, to make lateral BJT cause to make parasitic
vertical BJT.
I wonder "why PMOS TR is biased by high voltage?"
If I want to make lateral BJT, I don't have to make P mos TR.
But PMOS TR exists and I have to appliy high voltage.
why PMOS TR is biased by high voltage? If I don't, lateral BJT is not formed?
In P-substrate CMOS process, to make lateral BJT cause to make parasitic
vertical BJT.
I wonder "why PMOS TR is biased by high voltage?"
If I want to make lateral BJT, I don't have to make P mos TR.
But PMOS TR exists and I have to appliy high voltage.
why PMOS TR is biased by high voltage? If I don't, lateral BJT is not formed?