Since a capacitor is a two terminal device, is it possible to implement a MOSCAP with the D-S diffussion tied together with the tuning voltage, compared to the typical implementation where the tuning voltage is applied at the gate. Thanks in advance
if you want to use a normal NMOS as the varactor, you can connect the source and drain together in layout as you said. In fact, MOSCAP is a three terminals device, the gate, the source/drain and the p-sub. Normally the gate voltage is fixed the tuning voltage is applied to source/drain, this can reduce the effect of the parasitic cap from source/drain to p-sub. Thanks.
you must apply voltage at the gate in order to form an inversion layer. Therefore, the S/D and bulk should be tied together - and you can consider the transistor as a 2 terminal device.
Which is better tying the D-S-B together or tying the D-S together while grounding the B for nMOS or pulling to Vdd for pMOS in realizing a MOSCAP. Please do clarify whether pMOS is better off in realizing a MOS varactor rather than a nMOS. Thanks in advance
float moscaps is simply an pmos or even nmos in nwell with drain and source tied together to form one pin and gate the second pin.
but the accurate capacitance is not modeled in libraries unfortunately!
float moscaps is simply an pmos or even nmos in nwell
What do you mean nmos in nwell, is it equivalent to a AMOS with drain and source floating and the bulk together with the gate forms a two terminal MOSCAP, kindly confirm. Does the typical silicon process supports this?, although there's no any extra process step involved in this type of design. Thanks in advance