Continue to Site

Welcome to EDAboard.com

Welcome to our site! EDAboard.com is an international Electronics Discussion Forum focused on EDA software, circuits, schematics, books, theory, papers, asic, pld, 8051, DSP, Network, RF, Analog Design, PCB, Service Manuals... and a whole lot more! To participate you need to register. Registration is free. Click here to register now.

Ion Implantation in vlsi technology

Status
Not open for further replies.

vead

Full Member level 5
Full Member level 5
Joined
Nov 27, 2011
Messages
285
Helped
3
Reputation
6
Reaction score
3
Trophy points
1,298
Location
india
Activity points
3,815
Q1what is Ion Implantation in vlsi technology?
Q2what type of Impurity are added into silicon
substrate?
 

Ion implantation is a materials engineering process by which ions of a material are accelerated in an electrical field and impacted into a solid. This process is used to change the physical, chemical, or electrical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as various applications in materials science research.

Commonly used dopant are boron, phosphorus or arsenic.
https://en.wikipedia.org/wiki/Ion_implantation
 

Status
Not open for further replies.

Similar threads

Part and Inventory Search

Welcome to EDABoard.com

Sponsor

Back
Top