hrkhari
Full Member level 4
Hai Guys:
Based on the suggested inductor layout technique as attached substrate noise shielding is desired, hence a 50um X 50um P+ diffusion contact is placed at various distance d from the centre of the inductor which serves as a noise sensor. Also a 25um P+ diffusion guard ring is used to observe the reduction of substrate noise when the guard ring is grounded. These facts are taken from a thesis. The questions are:
1.Is the P+ diffusion contact placed at various distance d from the centre of the inductor which serves as a noise sensor, grounded?. How does it serve as a noise sensor?. Based on the distance constraint I suppose there is only four P+ diffusion contact of 50um X 50um could be placed surrounding the inductor provided that it is square, kindly clarify this.
2.It is also shown that there is a peripheral guard ring, is this a double guard ring or a P+ diffusion guard ring?.
Hope you could help out in clarifying the arising issues. Thanks in advance
Rgds
Based on the suggested inductor layout technique as attached substrate noise shielding is desired, hence a 50um X 50um P+ diffusion contact is placed at various distance d from the centre of the inductor which serves as a noise sensor. Also a 25um P+ diffusion guard ring is used to observe the reduction of substrate noise when the guard ring is grounded. These facts are taken from a thesis. The questions are:
1.Is the P+ diffusion contact placed at various distance d from the centre of the inductor which serves as a noise sensor, grounded?. How does it serve as a noise sensor?. Based on the distance constraint I suppose there is only four P+ diffusion contact of 50um X 50um could be placed surrounding the inductor provided that it is square, kindly clarify this.
2.It is also shown that there is a peripheral guard ring, is this a double guard ring or a P+ diffusion guard ring?.
Hope you could help out in clarifying the arising issues. Thanks in advance
Rgds
