ent_ee39
Newbie level 5
Hi all,
I have just begun to study about DC micro sputtering which is performed in SEM (scanning electron microscope) chamber.
I would like to ask anyone that if I want to know Argon ion and electron energy using in Sputtering process, how can I know them ?
For my experimental set up:
I use DC power supply to generate plasma.
Anode is orifice which is used for feeding Ar gas between two electrodes.
Cathode is silicon substrate.
When I operate the experiment, electron beam of SEM machine is on.
I use accelerated voltage = 5 KeV.
Could you please suggest me about this?
Thanks in advance,
Ent
I have just begun to study about DC micro sputtering which is performed in SEM (scanning electron microscope) chamber.
I would like to ask anyone that if I want to know Argon ion and electron energy using in Sputtering process, how can I know them ?
For my experimental set up:
I use DC power supply to generate plasma.
Anode is orifice which is used for feeding Ar gas between two electrodes.
Cathode is silicon substrate.
When I operate the experiment, electron beam of SEM machine is on.
I use accelerated voltage = 5 KeV.
Could you please suggest me about this?
Thanks in advance,
Ent