Yeah, you're right. The higher Vgs causes stronger vertical electric field. I read the paper by A. A. Abidi, it suggests that for PMOS, the flicker noise dependence on Vgs-Vth can apply to both surface-channel PMOS and buried-channel PMOS.
**broken link removed**
So it looks like no good theory to explain why high Vgs can cause larger flicker noise for surface-channel PMOS.
But for buried-channel PMOS, common theory is: because buried-channel is far away from Si-SiO2 surface, flicker noise is mainly due to mobility fluctuation(carrier interaction with lattice, I don't quite clear about this) which is kind of small; when Vgs becomes larger, it attracts lot of holes to the surfaces, which manifests the noise due to carrier-density fluctuation(carrier traped and released by the interface(Si-SiO2).
buried-channel PMOS is used to reduce Vth by adding a p-type implant to cancel the effect of ionized acceptor in substate.