AllenD
Member level 5
Hi Team,
I have a favor to ask.
Background:
I am trying to design a wide-band cmos LNA with certain topology. I started with my baseline design. Then I discovered that the performance of the LNA can be drastically improved if I kept the drain current same (Id=1.8 mA in my case) while increase the W/L of the input mosfet (the nmos whose gate is the input node). However, this forced the input nmos working in sub-threshold region(Vgs < Vth) while in my baseline design, the input nmos is working in saturation.
Questions:
1. Is sub-threshold region a reliable region to operate if I want to tapeout my circuit?
2. Comparing my baseline design to the new design, the major trade-off is that I gain the LNA performance and lose the input nmos operating region (from saturation to sub-threshold.) Can you please comment on this trade-off?
Thanks
Allen
I have a favor to ask.
Background:
I am trying to design a wide-band cmos LNA with certain topology. I started with my baseline design. Then I discovered that the performance of the LNA can be drastically improved if I kept the drain current same (Id=1.8 mA in my case) while increase the W/L of the input mosfet (the nmos whose gate is the input node). However, this forced the input nmos working in sub-threshold region(Vgs < Vth) while in my baseline design, the input nmos is working in saturation.
Questions:
1. Is sub-threshold region a reliable region to operate if I want to tapeout my circuit?
2. Comparing my baseline design to the new design, the major trade-off is that I gain the LNA performance and lose the input nmos operating region (from saturation to sub-threshold.) Can you please comment on this trade-off?
Thanks
Allen