icecream
Junior Member level 1
hi,
maybe someone can help me. I need to know, if there is any type of deposition technique (specifically - deposition of Pt), in which after deposition there is no need to anneal the created layer. Also i need to maintain the temperature of GaAs substrate under temperature of 500°C during deposition, from reason of unstable properties of GaAs at higher temperatures.
thanks
maybe someone can help me. I need to know, if there is any type of deposition technique (specifically - deposition of Pt), in which after deposition there is no need to anneal the created layer. Also i need to maintain the temperature of GaAs substrate under temperature of 500°C during deposition, from reason of unstable properties of GaAs at higher temperatures.
thanks