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Deposition techniques - need help

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icecream

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hi,
maybe someone can help me. I need to know, if there is any type of deposition technique (specifically - deposition of Pt), in which after deposition there is no need to anneal the created layer. Also i need to maintain the temperature of GaAs substrate under temperature of 500°C during deposition, from reason of unstable properties of GaAs at higher temperatures.

thanks
 

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