In regular CMOS there is an inescapable G-B oxide limit. Multi well or SOI free the body. The "rating" however tends to be about hot carrier drift at min L max Vdd low temp (with maybe a side of NBTI).
I have done numerous parts on SOI using cascading but there are key process features you need
In regular CMOS there is an inescapable G-B oxide limit. Multi well or SOI free the body. The "rating" however tends to be about hot carrier drift at min L max Vdd low temp (with maybe a side of NBTI).
I have done numerous parts on SOI using cascading but there are key process features you need