Puppet123
Full Member level 6

Hello,
I am doing Bipolar layout using two difference bipolar processes - one allows me to set the emitter area and lengths to whatever I want (there is a maximum) while another only has pre-determined npn bipolar cells that I have to use and then use multiples (ie. mult=n, where n is whatever emitter area I need).
What is the reason for the difference in these two PDKs/processes ? Is it because the npn in each PDK is modeled differently and I have to use multiples in one kit and not in the other ?
Thank you.
I am doing Bipolar layout using two difference bipolar processes - one allows me to set the emitter area and lengths to whatever I want (there is a maximum) while another only has pre-determined npn bipolar cells that I have to use and then use multiples (ie. mult=n, where n is whatever emitter area I need).
What is the reason for the difference in these two PDKs/processes ? Is it because the npn in each PDK is modeled differently and I have to use multiples in one kit and not in the other ?
Thank you.