musclesinwood
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Attached is my plot. Both are same. One is just background flipped to white. Its for a 3-bit flash ADC with 5 runs in mc.
Here is the monte carlo simulation for both process and mismatch variation for a 3-bit flash ADC. What do you conclude from this plot ?
Library I am using is L130E_HS12_V241_MC_CORNER.lib.scs
The ADC will not work over corners, process and mismatch variation. It only shows a marginal 2bit resolution with quite different switching voltages.
Try to separate the 3 environment effects. Just start with 3 corner simulations - you don't need MC for this.
Exactly. Only a poor 2bit resolution with quite different switching voltages.What you mean is over the corner simulation , process and mismatch variation , my ADC won't work ?
Seems that process variations aren't responsible for the bad behavior.In my previous simulation I did monte carlo simulation of the same circuit for only process variations with 5 runs. This time I did it for both process and mismatch.
Run 3 or 5 standard simulations with the corner libs (or sections) only: tt, ss, (sf, fs) & ff - and again compare their outputs.Please explain a little bit what that suppose to mean and how can I do this ?
Run 3 or 5 standard simulations with the corner libs (or sections) only: tt, ss, (sf, fs) & ff - and again compare their outputs
No, run standard simulation setup with the normal libs, no MC libs needed. (I don't know your lib setup).For the corner simulation as you have mentioned above do I follow the same procedure as mc or there is something different I need to do ?
Read the Cādence docu. And there are a lot of tutorials to be found in the internet.Any tutorial you recommend to do this.
Only necessary for MC simulation. Use sigma=1 (if you don't need millions of chips).And how I choose sigma. Like in my current mc simulation I ma chossing sigma = 3.
And how can I know which model libraries should I include for umc130nm technology for the corner simulation you mentioned above. ?
I think so. But you should find the correct setup in your PDK docu.Attached are the libraries I use which are standard for umc 130nm. Do I need to disable any of the model library while doing the corner simulation ?
So what youre saying is that I should do corner simulation with five different sections, doing corner simulation of each section separately. Like the model library in umc 130nm for section tt ( typical case model ) is L130E_HS_LVT12_V051_MC_CORNER.lib.scs with section: tt. So I should add this library in the model libraries and do corner simulation instead of MC and see results. The disable it and add another section like ss and analyze results
(though 5 iterations is statistically not-useful).
Attached are my plots for five different sections. ff, ss, tt, snfp and fnsp. Please have a look and comment.
... how can I right about it in the report with satisfactory text ?
Check the stages which could cause offset/gain drifts over temperature and corners. Run INL analyses vs. temperature and corners.
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