gold_kiss
Full Member level 4
tsmc 0.5u design rule
Hi,
Can anyone help me understanding why 2nd poly is afterall needed? Also wht is the maximum w/l that can be drawn for this particular process? Pls also tell me wht is minimum w/l value acceptable.
Can anyone upload device formation document for TSMC 0.35u 2P4M process.
Thanx,
Gold_kiss
Hi,
Can anyone help me understanding why 2nd poly is afterall needed? Also wht is the maximum w/l that can be drawn for this particular process? Pls also tell me wht is minimum w/l value acceptable.
Can anyone upload device formation document for TSMC 0.35u 2P4M process.
Thanx,
Gold_kiss