prcken
Advanced Member level 1
gcnmos
Hello,
I have a question about gate-coupled NMOS for ESD protection. Usually the GCNMOS is used as power clamp between VDD to VSS. P+ poly resistor and MOS capacitance are used to set the RC time constant to sense the ESD stress to help triggering the NMOS clamp, so, when you design this RC triggering circuit, how much voltage do you expect appear at the triggering node (the gate of the NMOS device)??? I know the RC constant should be slower than the rise time of the ESD pulse (e.g.10ns), and faster than the rise time of normal operation voltage (e.g. 1ms). But, I think more than that!!! I mean the triggering voltage at the gate should be set just more than the threshold voltage of the NMOS device. However, even if you set the RC time constant at µm range to meet the above statement, the triggering voltage can easily follow the stress reaching more than 10V, does that mean it threatens the gate oxide reliability???
regards!
Kehan
Hello,
I have a question about gate-coupled NMOS for ESD protection. Usually the GCNMOS is used as power clamp between VDD to VSS. P+ poly resistor and MOS capacitance are used to set the RC time constant to sense the ESD stress to help triggering the NMOS clamp, so, when you design this RC triggering circuit, how much voltage do you expect appear at the triggering node (the gate of the NMOS device)??? I know the RC constant should be slower than the rise time of the ESD pulse (e.g.10ns), and faster than the rise time of normal operation voltage (e.g. 1ms). But, I think more than that!!! I mean the triggering voltage at the gate should be set just more than the threshold voltage of the NMOS device. However, even if you set the RC time constant at µm range to meet the above statement, the triggering voltage can easily follow the stress reaching more than 10V, does that mean it threatens the gate oxide reliability???
regards!
Kehan