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- As the dimensions of the transistor get smaller , the minimum feature size of the design become very comparable to the wave length of the ultra-violet source used to draw the mask on the wafer and that's causes the light to diffract light through the mask openings and so distorts the design drawn on the wafer.
- OPC is the solution for this issue , this is done by making some changes to the design and the openings drawn on the mask so that after diffraction the resulted design is the desired one not the one drawn on the mask.
Note OPC is one of the resolution enhancement techniques (RET) as there are other problem caused by the small dimensions of the transistor.
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