Thickness metal 1, metal 2 and metal 3 technology AMI 0.5um

Hi everyone !

I would like to know the thickness (height) of Metal 1, Metal 2 and Metal 3 for the technology AMI 0.5 um with a lambda of 0.3.

I would be very grateful if you can help me !

Best regards !

Joaquín

Here's a general compilation of metal thicknesses for several process nodes:



Note that for process sizes ≧ 0.35µm upper and lower metal layers used to have the same thickness.

Even if somebody had this information directly, they wouldn't be able to tell you because of non-disclosure agreements. Are you working through MOSIS? They might have spice models or better documentation available from which you could estimate the inter-metal thicknesses.

I found this link to MOSIS which has lots of data. With some work, I'd bet you could get some reasonable estimates:
https://www.mosis.com/pages/Technical/Testdata/ami-c5-prm

beeflobill said:

With some work, I'd bet you could get some reasonable estimates:
https://www.mosis.com/pages/Technical/Testdata/ami-c5-prm

Click to expand...

Right! With values from the last extracted c5 run - and the specific resistivity of Al ρ_Al = 0.0282 Ω*µm you can estimate a thickness of 0.31µm for M1 & M2, and 0.56µm for M3.

Dear Erikl,

thank you for your response. Can you tell me what values from the last extracted C5 run should I take, for the calculation of the thickness of M1, M2 and M3 ?

I don´t know why you use the value 0.0282. in the file you gave me, each metal has it´s own resistivity.

Regards !

Joaquin

Can you tell me what values from the last extracted C5 run should I take

Click to expand...

I believe Erikl was looking at the Sheet Resistance. https://en.wikipedia.org/wiki/Sheet_resistance is a good reference here. This is a measure of the resistance of the metal, given a certain thickness. The parameter he gave was the resistivity of the metal layer independent of geometry.

The equation of resistance given in the wiki article was R = q * L/A. Note that the area is A = H*W. So, the full equation is R = q * L/ (H*W). I believe the parameter you want is H, the height of metal layer.

The sheet resistance in the file is measured in ohms/square. This corresponds to the assumption that the length L and with W are equal. So, making the assumption that L=W and putting that into the resistance equation, we get Rsq = q / H. So, rearrange the equation and we get that H = q / Rsq. In words, the metal height is equal to the metal resistivity divided by the resistance per square.

So, for layer M3, the highest metal layer, we have q = 0.0282 ohm/sq and Rsq = 0.05 ohm/um^2. With the equation we get H = 0.56um.

THank you ! One more question. Do you know where can I find the value of the thickness of the oxide layer (SiO2) in the technology AMI 0.5 um with a lambda of 0.3 um ?

regards !

Joaquin

erikl said:

Here's a general compilation of metal thicknesses for several process nodes:

View attachment 99421

Note that for process sizes ≧ 0.35µm upper and lower metal layers used to have the same thickness.

Click to expand...

This is a very strange table - lower metals thicker and wider then upper metals?!

Are they turning the chip upside down?

timof said:

This is a very strange table - lower metals thicker and wider then upper metals?!

Are they turning the chip upside down?

Click to expand...

Well observed, Max! I guess they simply mixed up lower & upper ;-)

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biolycans said:

... where can I find the value of the thickness of the oxide layer (SiO2) in the technology AMI 0.5 um with a lambda of 0.3 um ?

Click to expand...

Gate Oxide Thickness is given directly in the MOSIS AMI 0.5µm Test report, linked above.

Field Oxide and Intermetal Layer thicknesses you can calculate from the given CAPACITANCE PARAMETERS.